Electronic displays and metal micropatterned substrates having a graphic

ABSTRACT

Electronic displays and metal micropatterned substrates are described comprising a graphic defined by a contrasting area adjacent the graphic. In one embodiment, the graphic is visible when the display is viewed with reflected light and the graphic is substantially less visible or invisible when viewed with backlighting transmitted through the metal micropatterned substrate. The graphic and contrasting area have a total metal micropattern density that differs by no greater than about 5% and more preferably by no greater than 2%.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional application of application Ser. No.13/321,185, filed Jun. 18, 2010, now allowed, which is a national stagefiling under 35 U.S.C. 371 of PCT/US2010/039103, filed Jun. 18, 2010,which claims priority to Provisional Application No. 61/221,888, filedJun. 30, 2009, the disclosure of which is incorporated by reference inits/their entirety herein.

SUMMARY

In one embodiment, an electronic display is described comprising atransparent substrate having a metal micropattern wherein at least aportion of the metal micropattern is contiguous and in electricalconnection with circuitry of the electronic display. The metalmicropattern comprises at least one graphic defined by a contrastingarea adjacent the graphic. The metal micropattern of the graphic, themetal micropattern of the contrasting area, or a combination thereofcomprise non-contiguous micropattern features that are not in electricalconnection with the circuitry of the electronic display.

In other embodiments, (e.g. optionally transparent) substrates aredescribed comprising a metal micropattern having at least one graphicdefined by a contrasting area adjacent the graphic. In one embodiment,the graphic, the contrasting area, or a combination thereof comprisesnon-contiguous micropattern features that differ in density, dimension,shape, orientation, or a combination thereof. In another embodiment, thegraphic comprises (e.g. contiguous or non-contiguous) micropatternfeatures having a different orientation than the contrasting area. Inanother embodiment, the graphic, the contrasting area, or a combinationthereof comprise (e.g. contiguous or non-contiguous) parallel linearmicropattern features.

In another embodiment, a display is described comprising a metalmicropatterned transparent substrate wherein the metal micropatterncomprises at least one graphic. The graphic is visible when the displayis viewed with reflected light and the graphic is substantially lessvisible or invisible when viewed with backlighting transmitted throughthe metal micropatterned substrate. The graphic and contrasting areahave a total metal micropattern density that differs by no greater thanabout 5% and more preferably by no greater than 2%.

In each of the embodiments, the graphic is preferably selected from alogo, trademark, picture, text, indicia, or insignia. The micropatternfeatures comprise an arrangement of dots, lines, filled shapes, or acombination thereof. The lines may form unfilled shapes. In some favoredembodiments, the graphic is a visible graphic having, at least twodimensions of at least 0.5 mm. Particularly for embodiments wherein themetal pattern further provides an electronic function, the micropatternfeatures may comprise linear micropattern features that form a metalmesh cell design and (i.e. additional) micropattern features disposed inopen spaces of the mesh.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is an illustration of a metal pattern having heart-shapedgraphics.

FIG. 2 is another illustration of a metal pattern having heart-shapedgraphics.

FIG. 3 is an optical photomicrograph of a metal micropattern having acontiguous hexagonal metal mesh micropattern and an arrangement ofnon-contiguous (i.e. dot) micropattern features.

FIG. 4 is an optical photomicrograph of a metal micropattern having acontiguous hexagonal metal mesh micropattern and an arrangement ofnon-contiguous linear micropattern features having the same orientationas the hexagonal metal mesh micropattern.

FIG. 5 is an optical photomicrograph of a metal micropattern having acontiguous hexagonal metal mesh micropattern and an arrangement ofnon-contiguous linear micropattern features having a first orientationin a graphic portion of the micropattern and a different orientation inthe contrasting area adjacent the graphic portion.

FIG. 6 is an optical photomicrograph of a metal micropattern having acontiguous hexagonal metal mesh micropattern and an arrangement ofcontiguous linear micropattern features having the same orientation asthe hexagonal metal mesh micropattern.

FIG. 7 is an illustration of a metal pattern having a contiguousrectangular metal mesh pattern and an arrangement of contiguous linearpattern features having a different orientation than the metal meshpattern.

FIG. 8 is an illustration of a metal pattern having a contiguoushexagonal metal mesh pattern and a contiguous (i.e. rectangular) metalmesh micropattern having (i.e. linear pattern features) having adifferent orientation.

FIG. 9 is an illustration of a metal pattern having an arrangement ofnon-contiguous linear micropattern features having a first orientationin the heart-shaped graphics of the micropattern and a differentorientation in the contrasting area adjacent the graphics.

FIG. 10 is an illustration of the heart-shaped graphic pattern andcontrasting adjacent area of portion 10 of FIG. 9.

DETAILED DESCRIPTION

The present invention is directed to (e.g. transparent) substratescomprising a metal micropattern and electronic displays comprising ametal micropatterned transparent substrate. The metal micropatterncomprises at least one graphic defined by a contrasting area adjacentthe graphic. In some embodiments, at least a portion of the metalmicropattern provides an electronic function. In other embodiments, themetal micropattern (e.g. solely) provides an optical design effect,thereby forming a visible graphic.

As used herein “micropattern features” refers to an arrangement of dots,lines, filled shapes, or a combination thereof having a dimension (e.g.line width) at least 0.5 microns and typically no greater than 20microns. The dimension of the micropattern features can vary dependingon the micropattern selection. In some favored embodiments, themicropattern feature dimension (e.g. line width) is less than 10, 9, 8,7, 6, or 5 micrometers (e.g. 1-3 micrometers).

Although the micropattern features of the graphic and/or contrastingarea provide the visibility of the graphic, the metal pattern may alsocomprise larger pattern features, having a dimension greater than 20microns.

The selection of micropattern features affects the visibility of thegraphic. Some micropattern features result in the graphic havingsubstantially the same visibility when viewed with reflected light aswhen viewed with transmitted light. Other micropattern features resultin the graphic being (e.g. highly) visible when viewed in reflection,yet substantially less visible or invisible when viewed in transmission(e.g. with backlighting from an illuminated electronic display).

In some embodiments, it is desirable to select micropattern features toexploit diffractive phenomena to generate visibility under certainlighting conditions.

As such, in some embodiments, it is preferred that micropattern featuresinclude dimensions or spacing between features that is less thanapproximately 20 microns, and more preferably less than 15, 10, 9, 8, 7,or 6 microns. Preferred metal micropatterns that diffract light includemicropattern features or spacing between micropattern features of lessthan 5 microns, more preferably less than 4 microns, and even morepreferably less than 3 microns.

One example of diffractive phenomena leading to visibility is theseparation of incident directional (e.g. nearly collimated, as derivedfrom a point source at a large distance from the article) white lightinto spectral components reflected in different directions that givesrise to a rainbow appearance, particularly when viewed in reflectedwhite light. This is known as a diffraction effect of dispersion.Diffraction can also lead to an appearance of distortion or depth forthe graphic or contrasting area. This latter aspect of diffractivephenomena can provide metal micropatterned substrates having aholographic appearance.

As used herein “graphic” refers to a written or pictorial representationsuch as a logo, trademark, picture, text, indicia (i.e. identifyingmarks), insignia (i.e. distinguishing sign), or artistic design.Artistic designs are typically (e.g. non-functional) decorative designs.A linear uniform repeating micropattern such as conductive mesh bars isnot an “artistic” design.

In some favored embodiments, the metal micropattern comprises one ormore “visible graphics” of sufficient size that the graphic is apparent(i.e. readily seen, visible) and identifiable (i.e. to ascertaindefinitive characteristics of) to the unaided human eye of normal (i.e.20/20 vision). By “unaided”, it is meant without the use of a microscopeor magnifying glass.

The size of the graphic is dependent at least in part by the normalviewing distance. For example, if the graphic is present on a smalldisplay, such as a watch face, personal data assistant or mobile phone,wherein the typically viewing distance is about 20-50 centimeters, thegraphic has at least one visible dimension of at least 0.5 mm. Forlarger displays, such as standard sized computer monitors, large screentelevisions, or billboards, the graphic would typically be larger,having at least one visible dimension of at least 1 mm (e.g. for a 20cm×20 cm) computer monitor. In some embodiments, the graphic has atleast two orthogonal dimension that are at least 0.5 mm, 1 mm, 2 mm, 3mm, 4 mm or 5 mm. The graphic typically has at least one (i.e. visible)dimension that is at least 0.1%, 0.2%, 0.3%, 0.4%, or 0.5% up to about10% of the overall area of the metal micropatterned substrate ordisplay.

Alternatively, or in combination with comprising at least one visiblegraphic, the metal pattern may comprise a micrographic (i.e. having oneor both dimensions of less than 0.5 mm). A micrographic would typicallyrequire magnification to be identifiable. Micrographics have particularutility for covert authentication markings. However, covertauthentication markings are typically identifying marks, rather thanmerely a design.

The graphic is generally defined by a contrasting area adjacent thegraphic. The graphic has one or more micropattern features that differfrom the micropattern features of the contrasting area adjacent thegraphic. The graphic perceived by the unaided average human eye issubstantially (e.g. at least 25 times) larger than the micropatternfeatures that give rise to the appearance of the graphic(s) orcontrasting area.

In some embodiments, such as when the graphic is present in a centerportion of a metal micropattern (e.g. of a display), the contrastingarea is at least the (e.g. metal micropatterned) peripheral areaadjacent (e.g. surrounding) the graphic by a visually resolvabledistance to the unaided human eye. The contrasting area provides atleast an outline of the graphic, the outline typically having a width ofat least about 0.5 mm, 1 mm or 2 mm. In other embodiments, such as whenthe graphic is at a corner of a display, the contrasting area is theportion of the metal micropattern (e.g. of the display) adjacent thegraphic. In this embodiment, the graphic is also contrasted by the edgeof the display.

In some embodiments, the contrasting area is substantially free of metalmicropattern features, while the graphic comprises micropatternfeatures. For example, FIG. 1 is an illustration of a metal patternforming heart-shaped graphics. In other embodiments, the graphic issubstantially free of metal micropattern features, while the contrastingarea comprises micropattern features. For example, FIG. 2 is anotherillustration of a metal pattern forming heart-shaped graphics.

In yet other embodiments, both the graphic and contrasting area comprisemicropattern features that sufficiently differ such that the graphic isvisible. For example, FIG. 9 is an illustration of a metal patternhaving an arrangement of non-contiguous linear pattern features having afirst orientation in the heart-shaped graphics of the micropattern and adifferent orientation in the contrasting area adjacent the graphics.

For illustration purposes, the individual pattern (i.e. dot or lines)features of FIGS. 1-2 and 7-10 are apparent and identifiable asindividual pattern features. However, when the pattern features aremicropattern features (e.g. no greater than 20 microns in dimension),the individual (e.g. dots or lines) pattern features are notidentifiable. Rather, the micropattern features give rise to an average(e.g. shadowed) appearance for the graphic and/or the contrasting areaof the metal micropatterned substrate or display.

As depicted in FIGS. 1 and 9, the metal micropattern may be the samethroughout the graphic area. Likewise, as depicted in FIG. 2, the metalmicropattern may be the same throughout the contrasting area.Alternatively, the metal micropattern may include one or morecontrasting area portions, wherein the portions differ from each otherand also differ from the graphic. Further, portions of the contrastingarea may be the same as the graphic, provided that that the contrastingarea has sufficient differences such that the graphic is apparent andidentifiable.

In some favored embodiments, at least a portion of the metalmicropattern of the metal micropatterned substrate provides anelectronic function. For example, when the metal micropattern is of lowdensity, is contiguous, and is formed on a transparent substrate, it maybe useful as a transparent shield for electromagnetic interference (EMI)and the like for a display.

Alternatively or in combination with being useful as an EMI shield, insome embodiments, at least a portion of the metal micropattern iscontiguous and in electrical connection with circuitry of an electronicilluminated display such as touch sensor controller electronics of adisplay.

Touch sensor displays are known in the art and generally include a touchscreen panel having a touch sensing area that is electrically coupled toa touch sensor drive device. The touch screen panel is typicallyincorporated into an electronic display device, for example anilluminated electronic display device (i.e. the electronic displaydevice comprises the touch panel). The touch panel may be for example aresistive, surface capacitive, or projected capacitive type. The touchsensing area typically includes a visible light transparent substrateand an electrically conductive micropattern made of metal disposed on orin the visible light transparent substrate.

The electrically conductive micropattern can be formed of a plurality oflinear metal micropattern features (often referred to as metal traces)that form a two dimensional contiguous metal mesh. In some embodiments,the touch sensing area includes two or more layers of visible lighttransparent substrate, each having a (i.e. conductive) metalmicropattern. When the display includes two or more layers of visiblelight transparent substrate, each having a (e.g. conductive) metalmicropattern, the graphic may be formed from a portion of patternfeatures of (e.g. within) the first layer (e.g. overlayed with) aportion of pattern features of (e.g. within) the second layer.

Depending on the method of making the metal micropattern, the metalmicropattern may comprise (e.g. two dimensional) parallel linear traces(e.g. metal patterned wires).

Preferred (i.e. conductive) metal micropatterns include regions with twodimensional contiguous metal meshes, e.g. square grids, rectangular(non-square) grids, or (e.g. regular) hexagonal networks, whereconductive micropattern features such as micropatterned lines defineenclosed open areas within the mesh. The open spaces defined by themetal micropatterns can be described as cells. Other useful geometriesfor mesh cells include random cell shapes and irregular polygons.

The metal micropattern of the (e.g. transparent) substrate may bedescribed as comprising multiple micropatterns or micropattern portions.The metal micropattern may include a contiguous metal (e.g. mesh)micropattern and additional (i.e. non-contiguous or contiguous)micropattern features. In such embodiments, the “total metalmicropattern” includes all the metal micropattern features.

The total metal micropattern or the contiguous metal micropatternportion can be described with reference to the total surface area ofopen spaces. In some embodiments, the total metal micropattern orcontiguous metal micropattern portion has an open area of at least 60%,70%, 80%, 90%, 91%, 92%, 93%, 94%, or 95%. In preferred embodiments, thecontiguous metal micropattern portions have an open area of at least96%, 97%, 98%, 99%, or even at least 99.5%.

In other embodiments, the metal micropattern may solely provide anoptical design effect of providing a graphic that is visible whenilluminated by reflected light (e.g. ambient light). For example, themetal micropattern may be present on a portion of a protective (e.g.cover) film for an electronic display (e.g. an illuminated display) ormay be present on a portion of (e.g. privacy) window film. For suchembodiments, the metal micropattern does not serve an electricalfunction and thus may be free of contiguous metal micropatterns. In thisembodiments, the metal micropattern may only cover a portion of thedisplay surface and may only be slightly larger than the graphic itself.

In some embodiments, a (e.g. transparent) substrate is describedcomprising a metal micropattern comprising non-contiguous micropatternfeatures. By non-contiguous, it is meant that the micropattern featuresare unconnected to each other. In some embodiments, the micropatternfeatures are also non-contiguous (i.e. unconnected to) a contiguousmetal pattern portion.

The non-contiguous micropattern features may comprise an arrangement ofdots, lines, filled shapes, or a combination thereof. Further, the lines(i.e. linear micropattern features) may be arranged to form unfilledshapes such as circles, polygons, hearts, stars, etc. The arrangement ofmicropattern features (e.g. dots, lines, or filled shapes) may take theform of an array, characterized by translational or rotational symmetry.Alternatively, the arrangement of micropattern features may lack spatialregularity and thus comprise a pseudo-random arrangement of micropatternfeatures or a micropattern feature gradient. For example, the graphicmay have a higher density of micropattern features at the peripheraledges of a graphic than the center of a graphic. Or the graphic may havea micropattern feature density that reduces over an area such that thegraphic appears to fade.

In some favored embodiments, such as illustrated by FIG. 1, the graphiccomprises non-contiguous micropattern features and the contrasting arealacks (e.g. non-contiguous) micropattern features.

In some embodiments, as depicted in FIGS. 3-6, the metal micropatternfurther comprises a contiguous metal micropattern such as a metalhexagonal mesh micropattern and (e.g. additional) micropattern featuresdisposed in open spaces of the mesh.

With reference to FIG. 3, an optical photomicrograph of a metalmicropattern having a contiguous hexagonal metal mesh micropattern, thegraphic may comprise an arrangement of (e.g. dot) micropattern features,and the contrasting area (not shown) is free of non-contiguous (e.g.dot) micropattern features. With reference to FIG. 4, an opticalphotomicrograph of a metal micropattern having a contiguous hexagonalmetal mesh micropattern, the graphic may comprise an arrangement ofnon-contiguous linear micropattern features, with the contrasting area(not shown) being free of non-contiguous linear micropattern features.In FIG. 4, the non-contiguous linear micropattern features have the sameorientation as line features defining the hexagonal metal meshmicropattern.

Linear micropattern features having the same orientation aresubstantially parallel to each other (e.g. within 0-5 degrees). A linesegment of a metal micropattern feature may be straight or curved. Theorientation of a line, at a point along the line, is taken to be thedirection of a vector given by constructing a tangent to the linefeature at that point. For the purpose of designating the angle betweenthe orientations of two lines, the directions of tangent vectors arechosen such that the angle is the acute or right angle that is possiblebased on the aforementioned procedure for defining the orientation.

Alternatively, the graphic may be free of non-contiguous micropatternfeatures, with the contrasting area comprising non-contiguousmicropattern features. In this embodiment, FIGS. 3 and 4 would depictthe contrasting area, rather than the graphic.

As depicted in FIGS. 3 and 5, although the vast majority of micropatternfeatures are not in contact with the contiguous hexagonal metal meshmicropattern, a minor number (e.g. less than 20%) of micropatternfeatures may be in contact with or intersect with the contiguous metalmicropattern. In some favored embodiment, these intersections generallydo not affect the electrical properties of the contiguous metalmicropattern.

However, in other embodiments, such as depicted in FIG. 6, suchintersections would typically affect the electrical properties. FIG. 6,is an optical micrograph of a metal micropattern that further comprisesa contiguous metal micropattern such as a metal (e.g. hexagonal) meshmicropattern. The graphic, contrasting area, or a combination thereofcomprises parallel linear pattern features, i.e. linear pattern featuresof the same orientation.

Dot shaped pattern features are particularly useful for creating arainbow appearance diffraction effect. Further, parallel linearmicropattern features, such as depicted in FIGS. 4 and 6, areparticularly useful for producing a holographic appearance.

In yet other embodiments, both the graphic and contrasting area comprisenon-contiguous micropattern features that sufficiently differ from eachother such that the graphic is visible. The non-contiguous micropatternfeatures of the graphic may differ from the contrasting area in (i.e.micropattern) density, (i.e. micropattern) feature dimension, (i.e.micropattern) feature shape, (i.e. micropattern) feature orientation, ora combination thereof.

For example, both the graphic and contrasting area could comprise (e.g.dot) micropattern features of the same dimension (e.g. dot diameter),with the graphic having more dots per unit area than the contrastingarea, or vice-versa. As another example, the graphic could comprise(e.g. dot) micropattern features having a larger dimension (e.g. dotdiameter) than the contrasting area, or vice-versa. As yet anotherexample, the graphic and contrasting area may comprise non-contiguousmicropattern features that differ in micropattern feature shape. Forexample, the contrasting area may comprise linear micropattern features,such as depicted in FIG. 4 and the graphic may comprise an arrangementof dots, such as shown in FIG. 3.

With reference to FIG. 5, in a favored embodiment, the metalmicropattern comprises linear micropattern features that form a metalmesh cell design and non-contiguous micropattern features disposed inopen spaces of the mesh that are non-parallel relative to each other.Further, the depicted non-contiguous pattern features are alsonon-parallel to the linear micropattern features of the metal mesh celldesign.

As illustrated by the forthcoming examples, it has been found that whenboth the graphic and contrasting area each comprise non-contiguousmicropattern features that differ in orientation, the graphic can be(e.g. highly) visible when viewed in reflection, yet substantially lessvisible or invisible when viewed in transmission. This is a desirablevisual design effect regardless of whether the metal micropattern hasany other (e.g. electrical) function.

Hence, in another embodiment, such as illustrated by FIGS. 9 and 10, atransparent substrate is described wherein the metal micropatterncomprises at least one graphic and a contrasting portion adjacent thegraphic wherein the contrasting area comprises micropattern featureshaving a different orientation than the graphic (such that the graphicis viewable).

With reference to FIGS. 5, 9 and 10 micropattern features of a differentorientation are non-parallel to each other. In this embodiment, themicropattern features may not be dots or other rotational symmetricalshapes having the same appearance regardless of orientation. Themicropattern features may be filled or unfilled shapes and are typicallylinear micropattern features. The (e.g. linear) micropattern features ofthe contrasting area are typically rotated at least 10, 20 or 30degrees. As the angle of rotation increases, the visibility of thegraphic also increases. In some preferred embodiments, the (e.g. linear)micropattern features of the contrasting area are typically rotatedpreferably rotated at least 40, 50, 60, 70, 80, or about 90 degreesrelative to the micropattern features of the graphic.

As illustrated for Example in FIG. 10, the interface between a graphiccomprising non-contiguous pattern feature of a first orientation and thecontrasting area may comprise a combination of contrasting portions thatlack (e.g. non-contiguous) pattern features and portions that comprisemicropattern features of a different orientation.

In some embodiments, at least 5%, 10% or 25% by area of all of the metalmicropattern features of the contrasting area have a differentorientation than the graphic. In other embodiments, at least 50%, 75%,or greater, (e.g. all) of the metal micropattern features of thecontrasting area have a different orientation than the graphic.

With reference to FIGS. 7-8, micropattern features having differentorientations can also be employed in metal micropatterns wherein atleast a portion of the metal micropattern is contiguous and inelectrical connection with circuitry of an electronic display. In thisembodiment, the graphic may also be in electrical connection with thecircuitry of the electronic display.

FIG. 7 is an illustration of contiguous metal micropattern such as arectangular metal mesh micropattern. A portion of the open spaces of themesh comprise (i.e. linear) micropattern features that form an “X” in aportion of the cells. The cells including these additional “X” linearpattern feature form a portion of a graphic, or vice-versa. Although,the “X” (i.e. linear) micropattern features have the same orientation aseach other, these linear pattern features are non-parallel to the linearmicropattern features of the rectangular metal mesh and thus have adifferent orientation. Further, the “X” micropattern features arecontiguous with the rectangular metal mesh and thus are in electricalconnection with the circuitry of the electronic display.

FIG. 8 is an illustration of a contiguous (e.g. hexagonal) metal meshmicropattern that forms a portion of a graphic adjacent to a(rectangular) metal mesh micropattern. Although, a portion of the linearmicropattern features of the hexagonal metal mesh are parallel to thelinear micropattern feature of the rectangles, a major portion (i.e. atleast 50%) of the linear micropattern features of the hexagonal meshhave a different orientation.

The graphic and contrasting area of the metal micropattern of the (e.g.,transparent) substrate can be characterized by a determining the totalmetal micropattern density for the graphic, the contrasting area, or theentire metal micropattern. The total metal micropattern density of anarea is the total metal of any metal micropatterns that exist divided bythe area.

In some embodiments, the graphic has a greater total metal micropatterndensity than the density of the contrasting area by inclusion of theadditional micropattern features, or vice-versa. The difference in totalmetal micropattern density between the graphic and the contrasting areais typically no greater than 20%, 15%, or 10%.

The total metal micropattern density of a region of a metalmicropatterned transparent substrate affects light transmittance of thatregion (light transmittance being the percentage of incident light thatpasses through the substrate). As the total metal micropattern densityof the graphic increases, the visibility of the graphic when viewed inreflection also increases.

As the total metal micropattern density of the graphic decreases, thetotal area the graphic(s) can occupy while maintaining at least the sametransmission increases. In preferred embodiments, the metalmicropatterned substrate has a transmission of at least 80%, 85%, or 90%of at least one polarization state of visible light, where the %transmission is normalized to the intensity of the incident, optionallypolarized light.

When the total metal micropattern density of the graphic is relativelyhigh 10-20%, the graphic typically only occupies a small fraction (e.g.0.1% to 10%) of the total metal micropatterned substrate, especially inthe case of electronic displays. This ensures that the transmission ofthe total metal micropatterned substrate (i.e. including both thegraphic and contrasting area) is no less than 70% or 75%.

In some embodiments, such as depicted in FIGS. 4-6, the total metalmicropattern density of the graphic is no greater than 10%, 9%, 8%, 7%,or 6%. In preferred embodiments the total metal micropattern density,e.g. the difference in micropattern density between the graphic andcontrasting area, does not vary by more than 5%, 4%, 3%, or 2%. In morepreferred embodiments, the total metal micropattern density differs byno more than 1%, 0.5%, 0.25%, or 0 (i.e. no difference at all). Foruniformity in the appearance of (i.e. powered on) illuminated display,the difference in total metal micropattern density is preferably small,particularly when the metal micropattern is in the optical path of theentire viewable area of the display.

As the difference in total metal micropattern density between thegraphic and the contrasting area increases, the visibility of thegraphic also increases when viewed in transmission, e.g. as is the casefor viewing primarily with light that originates within an illuminatedelectronic display, when the metal micropatterned transparent substrateis integrated with the display and the light originating within thedisplay is transmitted through the substrate to the viewer.

In some embodiments, it is preferred that the graphic exhibits highvisibility in reflection and that the graphic have low visibilityrelative to the contrasting area when viewed in transmission, e.g. whenviewed with backlighting transmitted though the metal micropatternedsubstrate such as provided by an illuminated display.

In some embodiments, the total metal micropattern density of the graphicrelative to the contrasting area can be described by calculating acontrast ratio (i.e. the difference divided by the lower densityregion). Higher total metal micropattern contrast ratios between thegraphic and the contrasting region will lead to higher visibility forthe graphic when viewed in transmission. Thus, for embodiments where thevisibility of the graphic in transmission is desired to be low, thecontrast ratio is preferably less than 10 or 5, and more preferably lessthan 2, 1.50, 1.25, or 1.10.

The metal micropatterned (e.g., transparent) substrates described hereincan be prepared by etching a metal coating in a micropattern on asubstrate (e.g., transparent substrate), by micropatterningfunctionalizing molecules to provide a self-assembled monolayermicropattern. This can be achieved using a number of differenttechniques including microcontact printing, dip-pen nanolithography,photolithography, and ink-jet printing.

In some embodiments, the metal micropatterned substrates are suitablefor use in electronic displays. Electronic displays include reflectivedisplays and displays with internal sources of light. Electronicdisplays with internal sources of light include illuminated displays. By“illuminated” it is meant “brightened by light or emitting light”. Theilluminated display may be a liquid crystal display having abacklighting or edge lighting light source that may be external to thecore liquid crystal panel but internal to the display device overall. Orthe illuminated display may be an emissive display such as a plasmadisplay panel (PDP) or organic light emitting diode (OLED) display.Reflective displays include electrophoretic displays, electrowettingdisplays, electrochromic displays, and reflective cholesteric liquidcrystal displays. The metal micropatterned substrates of the inventionare especially useful as part of an illuminated electronic display.

In one favored embodiment, the graphic is visible when the display isviewed primarily with reflected light (e.g. such as when an illuminatedelectronic display is powered off) and the graphic is substantially lessvisible and preferably invisible when viewed with light that originatedfrom within the display and transmitted through the metal micropatternedsubstrate, such as when an illuminated electronic display is powered on.

“Self-assembled monolayer” generally refers to a layer of molecules thatare attached (e.g., by a chemical bond) to a surface and that haveadopted a preferred orientation with respect to that surface and evenwith respect to each other. Self-assembled monolayers have been shown tocover surfaces so completely that the properties of that surface arechanged. For example, application of a self-assembled monolayer canresult in a surface energy reduction and allow selective etching ofmetal that is not coated with the self-assembled monolayer.

Microcontact printing uses micropatterned elastomeric stamps, typicallymade from polydimethyl siloxane (PDMS) that are inked and placed onto asubstrate to localize a chemical reaction between molecules of the inkthat are able to form a self-assembled monolayer (SAM) and thesubstrate. The micropatterned SAM resulting from such technique haveserved as a resist for selectively etching metal and metalizedsubstrates, to form electrically conductive micropatterns.

The metal micropatterned substrate can generally be formed from anymetal or metalized substrate. As used herein, “metal” and “metalized”refers to an elemental metal or alloy that is suitably conductive forthe intended purpose.

Although metal patterned articles only intended to have a visible designwhen viewed in reflection could employ an opaque substrate such as asilicon wafer, in preferred embodiments, the metalized substrate istypically a metal-coated visible light transparent substrate.

As used herein, “visible light transparent” refers to the level oftransmission of unmetalized regions of the substrate being at least40%-90% transmissive to at least one polarization state of visiblelight, where the % transmission is normalized to the intensity of theincident, optionally polarized light, more preferably at least 80% oreven 90%.

Common visible light transparent substrates include glass and polymericfilms. A polymeric “film” substrate is a polymer material in the form ofa flat sheet that is sufficiently flexible and strong to be processed ina roll-to-roll fashion. By roll-to-roll, what is meant is a processwhere material is wound onto or unwound from a support, as well asfurther processed in some way. Examples of further processes includecoating, slitting, blanking, and exposing to radiation, or the like.Polymeric films can be manufactured in a variety of thicknesses, rangingin general from about 5 μm to 1000 μm. In many embodiments, polymericfilm thicknesses range from about 25 μm to about 500 μm, or from about50 μm to about 250 μm, or from about 75 μm to about 200 μm. Roll-to-rollpolymeric films may have a width of at least 12 inches, 24 inches, 36inches, or 48 inches.

Useful polymeric films include thermoplastic and thermoset polymericfilms. Examples of thermoplastics include polyolefins, polyacrylates,polyamides, polyimides, polycarbonates, and polyesters. Further examplesof thermoplastics include polyethylene, polypropylene,poly(methylmethacrylate), polycarbonate of bisphenol A, poly(vinylchloride), polyethylene terephthalate, and poly(vinylidene fluoride).Other useful polymer films that are useful as substrates includeabsorptive polarizing films, for example polarizing films based onpolyvinyl alcohol.

In some methods to fabricate the metal micropatterned transparentsubstrate, the (e.g. polymeric film) substrate first has a metalliccoating disposed on at least one major surface. The surface of asubstrate with a metallic coating disposed thereon is described hereinas a metalized surface of a substrate. The metallic coating is typicallya continuous metal coating that is then SAM micropatterned. TheSAM-micropatterned metal regions are retained on the substrate and themetal of the unmicropatterned regions is removed by wet etching, therebyforming a metal micropattern.

Alternatives to SAM-based micropatterning for the metal micropatterninclude photolithography with coated or laminated photoresist polymers,combined with etching or lift-off techniques, as are known in the art.

The metallic coating can be deposited using any convenient method, forexample sputtering, evaporation, chemical vapor deposition, or chemicalsolution deposition (including electroless plating).

The metallic coating comprises elemental metal, metal alloys,intermetallic compounds, metal sulfides, metal carbides, metal nitrides,or combinations thereof. Exemplary metals include gold, silver,palladium, platinum, rhodium, copper, nickel, iron, indium, tin,tantalum, aluminum, as well as mixtures, alloys, and compounds of theseelements. In some embodiments, preferred metals include metals that areeffectively colorless in their reflection (for example, silver asopposed to copper). This, in some embodiments, preferred metals includesilver, aluminum, nickel, palladium, and tin. Although still useful,less preferred metals include copper. Although conductive, copperexhibits colored reflection that can serve to undermine the visibilityor impact of the graphic in reflected light. In some embodiments, themetal of the metal micropattern is any metal other than copper.

The metallic coatings can be various thicknesses. However, the thicknessof the resulting conductive micropattern is generally equal to thethickness of the metallic coating.

In some embodiments, the metal micropatterns is relatively, ranging inthickness from about 5 nanometers to about 50 nanometers. In otherembodiment, the metal micropattern thicknesses, of at least 60 nm, 70nm, 80 nm, 90 nm, or 100 nm. In some embodiments, the thickness of the(e.g. conductive) metal micropattern is at least 250 nm. In someembodiments, the silver micropatterns have thicknesses of at least 300nm, 400 nm, 500 nm, 600 nm, 700 nm, 800 nm, 900 nm, and even 1000 nm orgreater. The other embodiments, the gold micropatterns have thicknessesof at least 300 nm, 350 nm, 400 nm, or greater. Metal micropatterns ofincreased thickness can be prepared as described in 61/220,407;incorporated herein by reference.

Microcontact printing typically utilizes a relief-micropatternedelastomeric stamp. Useful elastomers for forming the stamp includesilicones, polyurethanes, ethylene propylene diene M-class (EPDM)rubbers, as well as the range of existing commercially availableflexographic printing plate materials (for example, commerciallyavailable from E. I. du Pont de Nemours and Company, Wilmington, Del.,under the trade name Cyrel™). The stamp can be made from a compositematerial (for example, one of the aforementioned elastomers combinedwith a woven or non-woven fibrous reinforcement). Polydimethylsiloxane(PDMS) is particularly useful as a stamp material, as it is elastomericand has a low surface energy (which makes it easy to remove the stampfrom most substrates). PDMS is also commercially available. A usefulcommercially available formulation is Sylgard™ 184 PDMS (Dow Corning,Midland, Mich.). PDMS stamps can be formed, for example, by dispensingan uncrosslinked PDMS polymer into or against a micropatterned mold,followed by curing. The micropatterned features can be, for example,millimeter-sized, micrometer-sized, nanometer-sized, or a combinationthereof.

The master tool for molding the elastomeric stamps can be generated bypreparing a micropatterned photoresist using photolithography as knownin the art. The elastomeric stamp can be molded against the master toolby applying uncured PDMS to the master tool and then curing.

Microcontact printing can be carried out by using arelief-micropatterned stamp or printing plate made of elastomer incombination with a substantially flat substrate in order to transfer tothe substrate a micropatterned self-assembled monolayer (SAM) accordingto the relief micropattern of the stamp or plate. Alternatively,microcontact printing can be carried out by using a substantially flatstamp or printing plate made of elastomer in combination with arelief-micropatterned (or structured or microstructured) substrate (forexample, a coated polymer film with embossed surface structure on amajor surface) in order to transfer to the substrate a micropatternedself-assembled monolayer (SAM) according to the relief micropattern ofthe substrate (as described, for example, in U.S. Patent ApplicationPublication No. 2008-0095985-A1 (Frey et al.), the description of whichis incorporated herein by reference).

The “ink” comprises molecules capable of forming a self-assembledmonolayer. Various molecules that form a self-assembled monolayer (SAM)are known. Such molecules include various organosulfur compoundsincluding for example alkylthiols, dialkyl disulfides, dialkyl sulfides,alkyl xanthates, dithiophosphates, and dialkylthiocarbamates. Themolecules are characterized by a tail group or groups attached to asulfur atom, wherein the tail group or groups have between 14 and 20atoms along their backbone, preferably 16, 17, or 18 atoms. The atomsalong the backbone are preferably carbon atoms.

Preferably the ink solution comprises alkyl thiols such as, for example,linear alkyl thiols:

HS(CH₂)_(n)X

where n is the number of methylene units and X is the end group of thealkyl chain (for example, X=—CH₃, —OH, —COOH, —NH₂, or the like).Preferably, X=—CH₃ and n=15, 16, or 17, corresponding to chain lengthsof 16, 17, or 18, respectively. Other useful chain lengths include 19and 20. For linear molecules bearing a sulfur-containing head group forattachment to a metal, the chain length is determined as the number ofatoms along the linear arrangement of bonded atoms between and includingthe atom that is bonded to the sulfur atom and final carbon atom in thelinear arrangement. The monolayer-forming molecule may comprise otherend groups or be branched (e.g. with side groups) provided that themolecule is suitable to form a self-assembled monolayer that functionsas an etch resist. The SAM-forming molecules may also be partiallyfluorinated or perfluorinated, for example as described in U.S. PatentApplication Ser. No. 61/121,605, filed Dec. 11, 2008.

As is known in the art, such printing can include a displacementreaction that results in removal or modification of an atom orfunctional group in the SAM-forming molecules (for example, conversionof a thiol (R—SH compound) to a thiolate (R—S-M) monolayer when themonolayer is formed on a metal (M), for example silver or gold). Thus,the resulting printed micropattern can comprise compounds or moleculesthat are chemically different from the molecules of the ink composition.

Optionally, but preferably, the ink compositions can further comprise atleast one solvent.

Suitable solvents for use in the ink compositions include alcohols,ketones, aromatic compounds, heterocyclic compounds, fluorinatedsolvents, and the like, and combinations thereof. Other useful solventsinclude dimethylformamide, acetonitrile, dimethylacetamide,dimethylsulfoxide, ethyl acetate, tetrahydrofuran (THF), methyl t-butylether (MTBE), and the like, and combinations thereof.

Preferably, the solvent of the ink composition can be selected so as toevaporate relatively rapidly from the stamp surface, as this can also behelpful for achieving a relatively uniform distribution of the SAMforming molecules on or within the stamp with a minimum of time andapplication of forced air. The solvents are chosen such that the solventdoes not excessively swell the (e.g. PDMS) stamp.

The ink compositions can comprise relatively small amounts of commonadditives (for example, stabilizers or desiccants), if desired, as knownin the art.

The stamp can be “inked” with a composition comprising molecules capableof forming a SAM using methods known in the art.

The SAM micropatterned substrate can be used as a resist that protectsthe underlying substrate surface during a subsequent etching step. Thus,it can serve as an etch mask that protects against the action of anetchant, while the other region(s) (i.e. lacking the micropatternedmonolayer) on the surface of the substrate are not protected, allowingselective removal of material (for example, metal) in the exposedregion(s).

Etching refers to the removal of material, for example in a wet chemicalsolution by dissolution, chemical reaction, or a combination thereof.The unpatterened regions are preferably etched as described in61/220,407.

The etching of the exposed region is selective, i.e. without significantetching of the surface regions comprising the SAM micropattern. In someembodiments, less than about 50% by mass of the SAM micropatternedregions are removed via wet etching per unit area. In preferredembodiments, less than about 25% by mass, less than about 10% by mass,or less than about 5% by mass of the SAM micropatterned regions areremoved via wet etching per unit area. This can be determined by usingknown methods such as transmitted light attenuation, profilometry, massanalysis, or the like.

Useful chemical etching baths can be prepared by dissolving etchantspecies in water or a non-aqueous solvent (for example, with agitationor stirring, control of pH, control of temperature, and/or replenishmentof etchant species upon their consumption, according to the nature ofthe etchant).

The etchant bath typically comprises at least one oxidizing agent.Suitable (e.g. small molecule) oxidizing agents include for examplecyanide/oxygen, ferricyanide, and ferric ions.

The etchant bath also typically comprises at least one metal complexingcompound such as thiourea (NH₂)₂CS or a thiourea derivative (i.e. aclass of compounds with the general structure (R¹R²N)(R³R⁴N)C═S whereinR¹, R², R³, R⁴ each are independently hydrogen atoms or some organicmoiety such as ethyl or methyl). Thioureas are related to thioamidese.g. RC(S)NR₂, where R is methyl, ethyl, etc. Thiourea-based etchantswith ferric ions as an oxidizing species are generally preferred etchantsolutions, particularly for etching silver or gold.

The etchant may also comprise self-assembling monolayer formingmolecules. However, good micropattern feature uniformity, increasedmetal micropattern thickness, or a combination thereof were obtainedusing a liquid etchant that is free of self-assembling monolayer formingmolecules.

Once the metal of the unmicropatterned regions has been removed, theetchant (e.g., the oxidizing agent and metal complex forming molecule)is typically washed away from the surface of the etched microcontactprinted metal micropattern. Although it is intended to completely removethe etchant, it is not uncommon for very small concentrations of the wetetchant components to remain. The presence of such wet etchantcomponents can be determined by various quantitative and/or qualitativeanalysis such as surface-enhanced Raman scattering, X-ray photoelectronspectroscopy, Auger electron spectroscopy, secondary ion massspectrometry, and reflectance infrared spectroscopy.

Metal micropatterned substrates of the current disclosure may becombined with (e.g. laminated with) coatings, films, or componentsserving other functions, for example hard-coats or hard-coated films,anti-smudge surface coatings or films, neon cut filter films, EMIshielding films, films or components with anti-reflective surfaces,films or components with adhesive layers or surfaces, optically clearadhesives, or polarizing films. Furthermore, metal micropatternedsubstrates of the current disclosure may be integrated (e.g. bondeddirectly) to an (e.g. illuminated) display.

Objects and advantages of this invention are further illustrated by thefollowing examples, but the particular materials and amounts thereofrecited in these examples, as well as other conditions and details,should not be construed to unduly limit this invention. These examplesare merely for illustrative purposes only and are not meant to belimiting on the scope of the appended claims.

Metalized Polymer Film Substrates

Metalized polymer film substrates were provided were prepared by thermalevaporation of silver at a thickness of 70-100 nm onto 5 milpolyethyleneterephthalate “PET” (ST504, E. I. DuPont de Nemours andCompany, Wilmington, Del.).

Stamp Fabrication

For each of the exemplified metal micropatterns of FIGS. 1-4, a mastertool for molding elastomeric stamps was generated by preparingmicropatterned photoresist (Shipley1818, Rohm and Haas Company,Philadelphia, Pa.) on 10-centimeter diameter silicon wafers usingphotolithography. The master tools had a micropattern of photoresistdisposed thereon comprising trenches (photoresist material removed) inthe micropattern of a hexagonal mesh of lines (hexagonal cell geometrywith 97 percent open area and 3 micrometer wide lines forming hexagons).Each of the master tools had additional diffractive micropatternfeatures that formed a (11 mm by 5.5 mm) “3M” graphic as willsubsequently be described.

The geometry of thin film metal micropattern is the same as the geometryof recessed features or trench features in the master tool.

An elastomeric stamp was molded against the master tool by pouringuncured polydimethylsiloxane (PDMS, Sylgard™ 184, Dow Corning, MidlandMich.) over the tool to a thickness of approximately 3.0 millimeters.The uncured silicone in contact with the master was degassed by exposingto a vacuum, and then cured for 2 hours at 70° C. After peeling from themaster tool, a PDMS stamp was provided with a relief micropatterncomprising raised features approximately 1.8 micrometers in height. Theraised features of the stamp were the lines defining the respective meshgeometry. The stamp was cut to a size of approximately 10 by 10centimeters.

Inking

The stamp was inked by contacting its back side (flat surface withoutrelief micropattern) to a solution of 5 mM octadecylthiol (“ODT” 00005,TCI AMERICA, Wellesley Hills, Mass.) in ethanol for 20 hours.

Stamping

Metalized polymer film substrates were stamped with the described inkedstamp. For stamping, the metalized film was contacted to the stamprelief micropatterned-surface, which was faced up, by first contactingan edge of the film sample to the stamp surface and then rolling thefilm into contact across the stamp, using a roller with diameter ofapproximately 3.0 centimeters. The rolling step required less than 5seconds to execute. After the rolling step, the substrate was contactedwith the stamp for 10 seconds. Then, the substrate was peeled from thestamp, a step that required less than 1 second.

Etching

After stamping, the metalized film substrate with the SAM-printedmicropattern was placed in the etch bath for selective etching and metalmicropatterning. The etch bath was prepared by adding 5.8 g thiourea(99%, Alfa Aesar, Mass., USA, CAS 62-56-6) and 20.8 g ferric nitratenonahydrate (EMD Chemicals, Inc., Darmstadt, Germany, CAS 7782-61-8) to2500 mL DI water. The metalized film substrate with the SAM-printedmicropattern was placed in the etch bath face down while the etch bathwas agitated by bubbling nitrogen for approximately 3 minutes.

The total size of the metal micropatterned substrate was approximately 9cm×8 cm. The substrate was divided into four quadrants of approximatelyequal size. In each of the four quadrants there existed a pattern ofcontiguous hexagonal metal mesh and non-contiguous micropatternfeatures. In each of the four quadrants there existed a graphic in theshape of the 3M logo. The “3M” graphic was approximately 1.1 cm×0.6 cmin size.

Each of the quadrant had a different metal micropattern design, asdescribed as follows:

FIG. 3 is an optical photomicrograph of a metal micropattern having acontiguous hexagonal metal mesh micropattern (2-3 m wide linear metalfeatures forming a hexagonal mesh wherein the hexagons have a diameterof 300 m) that constitutes the conductive bars of a touch sensor and anarray of non-contiguous (i.e. dot) micropattern features (3 m×3 m dotson a triangular array with spacing of 10.2 m). This array ofnon-contiguous dots was present only in the “3M” graphic of Quad 1;whereas the contrasting portion adjacent (e.g. surrounding in Quad 1)the graphic only had the contiguous hexagonal metal mesh micropatternand lacked the non-contiguous (i.e. dot) micropattern features. The dotsize and spacing resulted in the 3M graphic having a total metalmicropattern density of 11-12%; whereas the contrasting hexagonal metalmesh micropattern outside of the graphic had a total metal micropatterndensity of 1.3-2%. The metal micropattern contrast ratio for thisgraphic was approximately 7. The difference in shadowed area fraction(i.e., difference in total metal micropattern density) within andoutside this logo was approximately 10% (11.3-12% minus 1.3-2%).

FIGS. 4 and 6 are photomicrographs of metal micropattern having acontiguous hexagonal metal mesh micropattern (2-3 m wide linear metalfeatures forming a hexagonal mesh wherein the hexagons have a diameterof 300 m) that constitutes the conductive bars of a touch sensor and anarray of (i.e. 2-3 m wide) linear micropattern features. This array oflinear micropattern features was present only in the “3M” graphic ofQuads 2 and 4; whereas the contrasting portion adjacent (e.g.surrounding) the graphic only had the contiguous hexagonal metal meshmicropattern and lacked the non-contiguous (i.e. linear) micropatternfeatures. For Quads 2 and 4, the additional linear diffractivemicropattern resulted in the 3M graphic having a total metalmicropattern density of 2.6-4%; whereas the contrasting hexagonal metalmesh micropattern outside of the graphic had a total metal micropatterndensity of 1.3-2%. The metal micropattern contrast ratio for thisgraphic is approximately 2. The difference in shadowed area fractionwithin and outside this logo was approximately 1.3-2% (2.6-4% minus1.3-2%).

FIG. 5 is a photomicrograph of a metal micropattern having a contiguoushexagonal metal mesh micropattern (2-3 m wide linear metal featuresforming a hexagonal mesh wherein the hexagons have a diameter of 300 m)that constitutes the conductive bars of a touch sensor and an array ofnon-contiguous (i.e. 2-3 m wide) linear micropattern features. The arrayof non-contiguous linear micropattern feature have a single orientationin the “3M” graphic of FIG. 5; whereas the contrasting portion adjacent(e.g. surrounding) the graphic also had an array of non-contiguouslinear micropattern feature at a different (e.g. orthogonal orientationrelative to the non-contiguous micropattern features of the graphic. Thephotomicrograph of FIG. 5 shows the orientations of the additional lineelements within and outside the “3M’ graphic. The non-contiguous linearmicropattern features had a length of 28.3 m; a width of 2-3 m, and arespaced according to the following repeat distances: 1st axis pitch 43.3m; 2nd axis pitch 42.9 m.

The total metal micropattern density was approximately 4.35 to 6.57% forthe metal micropattern area of the graphic and it is the same for thecontrasting metal micropattern outside the “3M” graphic. The metalmicropattern contrast ratio for this graphic was approximately 1. Thedifference in shadowed area fraction within and outside this logo wasapproximately 0% (4.35-6.57% minus 4.35-6.57%).

To evaluate the appearance of the metal micro patterned substrate, thesubstrate was held against a computer monitor (NEC MultiSync LCD 1760NX)with a brightness setting at 100% and the room lights (i.e. ambientlight) on. The monitor was situated at several different viewing anglesranging from approximately normal (i.e. 90 degrees) to 45 degrees to theviewer, and the viewer's eyes were positioned at several viewingdistances, ranging from approximately 30 cm-50 cm from the monitor frontsurface. For viewing the patterned substrate in transmission a whitebackground (i.e. the Google™ homepage) was used, and for viewing inreflection the monitor was turned off such that only the ambient roomlights were illuminating the sample. The position of the sample on themonitor was unchanged when switching between transmission viewing andreflection viewing.

The appearance of the 3M graphic was as described in the followingtable.

Appearance of 3M graphic Appearance of 3M graphic Quadrant when viewedin Transmission when viewed in Reflection 1 Visible as a gray “3M” “3M”is very visible with bright, angle-dependent color, at most viewingangles 2 Very slightly visible as a “3M” appears slightly bright lightgray “3M” against a dark background for some viewing angles and muted atother viewing angles 3 No visible “3M” “3M” appears i) bright againstdarker background for some viewing angles; ii) dark against brighterbackground for some viewing angles; and iii) muted at other viewingangles 4 Very slightly visible as a “3M” appears slightly bright lightgray “3M” against a dark background for some viewing angles and muted atother viewing angles

What is claimed is:
 1. A substrate comprising a metal micropatternhaving at least one graphic defined by a contrasting area adjacent thegraphic wherein the graphic and the contrasting area comprisenon-contiguous micropattern features that differ in density, dimension,shape, orientation, or a combination thereof, and wherein the totalmetal micropattern density of the graphic is no greater than 10%.
 2. Thesubstrate of claim 1 wherein the non-contiguous micropattern featurescomprise an arrangement of dots, lines, filled shapes, or a combinationthereof.
 3. The substrate of claim 2 wherein the lines form unfilledshapes.
 4. The substrate of claim 2 wherein the graphic comprisesnon-contiguous micropattern features and the contrasting area is free ofnon-contiguous micropattern features.
 5. The substrate of claim 2wherein the contrasting area comprises non-contiguous micropatternfeatures and the graphic is free of non-contiguous micropatternfeatures.
 6. The substrate of claim 1 wherein the graphic is selectedfrom a logo, trademark, picture, text, indicia, or insignia.
 7. Thesubstrate of claim 1 wherein the graphic has at least two dimensions ofat least 0.5 mm.
 8. The substrate of claim 1 wherein the micropatternfeatures are linear micropattern features or filled shapes having awidth of less than 10 microns.
 9. The substrate of claim 8 wherein themicropattern features have a width of less than 5 microns.
 10. Thesubstrate of claim 1 wherein the graphic and contrasting area have atotal metal micropattern density that differs by no greater than about5%.
 11. The substrate of claim 10 wherein the graphic and contrastingarea have a total metal micropattern density that differs by no greaterthan about 1%.
 12. The substrate of claim 1 wherein the substrate is atransparent substrate.
 13. A substrate comprising a metal micropatternhaving at least one graphic defined by a contrasting area adjacent thegraphic wherein the graphic comprises micropattern features having adifferent orientation than the contrasting area, and wherein the totalmetal micropattern density of the graphic is no greater than 10%. 14.The substrate of claim 13 wherein the micropattern features of thegraphic are linear micropattern features orientated at angles rangingfrom 30 degrees to 90 degrees relative to linear micropattern featuresof the contrasting area.
 15. The substrate of claim 13 wherein themicropattern features comprise linear micropattern features that form ametal mesh cell design.
 16. The substrate of claim 15 wherein the linearmicropattern features are contiguous with the metal mesh.
 17. Thesubstrate of claim 16 wherein the linear micropattern features form ametal mesh cell design and the metal mesh cell design of the graphic hasa different cell geometry than the contrasting area.
 18. A substratecomprising a metal micropattern having at least one graphic defined by acontrasting area adjacent the graphic wherein the graphic, thecontrasting area, or a combination thereof comprise parallel linearmicropattern features, and wherein the total metal micropattern densityof the graphic is no greater than 10%.
 19. The substrate of claim 18wherein the linear micropattern features form a metal mesh cell designand the parallel linear micropattern features are parallel to the metalmesh design.
 20. A display comprising a metal micropatterned transparentsubstrate wherein the metal micropattern comprises at least one graphicthat is visible when the display is viewed with reflected light and thegraphic is substantially less visible or invisible when viewed withbacklighting transmitted through the metal micropatterned substrate, andwherein the total metal micropattern density of the graphic is nogreater than 10%.
 21. The display of claim 20 wherein the graphic isdefined by a contrasting area adjacent the graphic and the graphic andcontrasting area have a total metal micropattern density that differs byno greater than about 5%.
 22. The display of claim 21 wherein thegraphic and contrasting area have a total metal micropattern densitythat differs by no greater than about 1%.
 23. The display of claim 20wherein the graphic occupies up to about 10% of the total metalmicropatterned area of the substrate.
 24. The display of claim 20wherein the metal micropatterned substrate has an average transmissionof at least 80%.